An oxidation barrier layer for metal-insulator-metal capacitors: Ruthenium silicide

Thin Solid Films

Volumn 437, Issue 1-2, 2003, Pages 51-56

  Matsui, Y ^a   Nakamura, Y ^b   Shimamoto, Y ^a   Hiratani, M ^a  

^a HITACHI LTD   (Japan)

^b Elpida Memory Inc   (Japan)

Author keywords

Capacitors; Diffusion; Ruthenium; Silicides

Indexed keywords

DIFFUSION; METAL INSULATOR BOUNDARIES; OXIDATION; RUTHENIUM COMPOUNDS;

OXIDATION BARRIER;

CAPACITORS;

EID: 0038448123     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00606-0     Document Type: Article

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