Passive Integration Process on Standard and High Resistivity Silicon

International Journal of Microcircuits and Electronic Packaging

Volumn 22, Issue 3, 1999, Pages 254-261

  Kattelus, H ^a   Ronkainen, H ^a   Riihisaari, T ^a  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

Author keywords

Hafnium Oxide; Integrated inductors; Passive Integration; Quality Factor; Tantalum Oxide; Thin Film Resistors

Indexed keywords

EID: 0038413219     PISSN: 10631674     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

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