Effect of Al interlayers on two-step epitaxial growth of CoSi 2 on Si(1 0 0)

Applied Surface Science

Volumn 216, Issue 1-4 SPEC., 2003, Pages 174-180

  Nakatsuka, Osamu ^a   Onoda, Hiroyuki ^a   Okada, Emi ^a   Ikeda, Hiroya ^a,b   Sakai, Akira ^a   Zaima, Shigeaki ^a   Yasuda, Yukio ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

CoSi 2; Epitaxy; Interface; STM; TEM; Two step growth

Indexed keywords

ALUMINUM; COBALT COMPOUNDS; EPITAXIAL GROWTH; TRANSMISSION ELECTRON MICROSCOPY;

TWO-STEP GROWTH;

INTERFACES (MATERIALS);

EID: 0038345981     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00454-9     Document Type: Conference Paper

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