Nanoscale investigation on nature of dark hole in moisture-exposed tris(8-hydroxyquinoline) aluminum thin films

Chemical Physics Letters

Volumn 374, Issue 5-6, 2003, Pages 656-660

  Xu, M S ^a   Xu, J B ^a   Luo, E Z ^a   Xie, Z ^b  

^a CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^b HUNAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038308797     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(03)00804-2     Document Type: Article

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