Dielectric properties of RF-sputtered silicon nitride thin films with gold electrodes

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 309-314

  Gould, R D ^a   Awan, S A ^a  

^a KEELE UNIVERSITY   (United Kingdom)

Author keywords

Dielectric properties; Electrical properties and measurements; Silicon nitride; Sputtering

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRODES; FREQUENCIES; GOLD; PERMITTIVITY; SILICON NITRIDE; SPUTTERING;

CARRIER HOPPING;

THIN FILMS;

EID: 0038277039     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00302-X     Document Type: Conference Paper

References (21)

1. Kapoor V., Baily R.S., Stein H.J. J. Vac. Sci. Technol. Part A. 1:1993;600.
2. Malik A., Wang X.W., Ma T.P., Cui G.J., Tamagawa T., Halpen B.L., Schmitt J.J. J. Appl. Phys. 79:1996;8507.
3. Park D.G., Tao M., Li D., Botchkarev E., Fan Z., Wang Z., Mohammad S.N., Rockett A., Abelson J.R., Morkoç M., Heyd A.R., Alterovitz S.A. J. Vac. Sci. Technol. Part B. 14:1996;2674.
4. Chang K.-M., Tsai J.-Y., Li C.-H., Yeh T.-H., Wang S.-W., Yang J.-Y. J. Appl. Phys. 79:1996;8503.
5. Ma T.P. IEEE Trans. Electron. Devices. 45:1998;680.
6. Rieder G., Olcaytug F. Thin Solid Films. 89:1982;95.
7. Ye C., Ning Z., Shen M., Wang H., Gan Z. Appl. Phys. Lett. 71:1997;336.
8. Martin F., Aymerich X. Thin Solid Films. 221:1992;147.
9. Hseih S.W., Chang C.Y., Lee Y.S., Lin C.W., Hsu S.C. J. Appl. Phys. 76:1994;3645.
10. Awan S.A., Gould R.D., Gravano S. Thin Solid Films. 355/356:1999;456.
11. Gould R.D., Awan S.A. Thin Solid Films. 398/399:2001;454.
12. Mott N.F., Davis E.A. Electronic Processes in Non-Crystalline Materials. 1971;Clarendon Press, Oxford.
13. Elliott S.R. Phil. Mag. 36:1977;1291.
14. Al-Dhhan Z.T., Hogarth C.A. Int. J. Electron. 63:1987;707.
15. Lopez M.G., Gould R.D. Thin Solid Films. 254:1995;291.
16. Argall F., Jonscher A.K. Thin Solid Films. 2:1968;185.
17. Robertson J. Phil. Mag. Part B. 69:1994;307.
18. Sullivan L., Card H.C. J. Phys. D: Appl. Phys. 7:1974;1531.
19. Sze S.M. J. Appl. Phys. 38:1967;2951.
20. Goswami A., Goswami A.P. Thin Solid Films. 16:1973;175.
21. Simmons J.G., Nadkarni G.S., Lancaster M.C. J. Appl. Phys. 41:1970;538.