Abnormal growth of LPCVD SiO2 on CoSi2 by high dose As implantation

Thin Solid Films

Volumn 434, Issue 1-2, 2003, Pages 69-74

  Cho, Ihl Hyun ^a   Sung, Nak Kyun ^a   Shim, Hyun Suk ^a   Ryu, Hyuk Hyun ^a   Ha, Jae Hee ^a   Lee, Won Gyu ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Arsenic; Chemical vapor deposition; Oxidation; Silicide; Silicon oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COBALT COMPOUNDS; CRYSTAL GROWTH; OXIDATION; SILICA; SILICATES;

ORTHOSILICATES;

ION IMPLANTATION;

EID: 0038277001     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00454-1     Document Type: Article

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