Synthesis of B-C-N thin films by electron beam excited plasma CVD

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 1290-1294

  Hasegawa, Takeshi ^a   Yamamoto, Kazuhiro ^b   Kakudate, Yozo ^b  

^a JAPAN FINE CERAMICS CENTER   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

B C N; CVD; Hardness; Plasma

Indexed keywords

BORON; CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRON BEAMS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; HYDROGEN; PLASMAS; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLOW RATE RATIOS;

THIN FILMS;

BORON NITRIDE; FILM; FLOW RATIO; PLASMA TREATMENT; SYNTHESIS; VAPOR DEPOSITION;

EID: 0036508150     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00613-6     Document Type: Article

References (15)