Comparative study of depth and lateral distributions of electron excitation between scanning ion and scanning electron microscopes

Journal of Electron Microscopy

Volumn 52, Issue 3, 2003, Pages 291-298

  Ohya, Kaoru ^a   Ishitani, Tohru ^b  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Material contrast; Monte Carlo simulation; Scanning electron microscope; Scanning ion microscope; Secondary electron emission; Spatial resolution

Indexed keywords

ATOMS; ELECTRONS; IMAGE RESOLUTION; INTELLIGENT SYSTEMS; ION BOMBARDMENT; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION;

DEPTH DISTRIBUTION; ELECTRON EXCITATIONS; LATERAL DISTRIBUTIONS; MATERIAL CONTRAST; MONTE CARLO'S SIMULATION; SCANNING ELECTRON MICROSCOPE; SCANNING ELECTRONS; SCANNING ION MICROSCOPES; SECONDARY ELECTRON EMISSIONS; SPATIAL RESOLUTION;

IONS;

EID: 0038115131     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/jmicro/52.3.291     Document Type: Article

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