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Journal of Electron Microscopy

Volumn 51, Issue 4, 2002, Pages 207-213

Origins of material contrast in scanning ion microscope images

(4) Ishitani, Tohru a Madokoro, Yuichi a Nakagawa, Mine b Ohya, Kaoru c

a HITACHI HIGH TECHNOLOGIES CORPORATION (Japan)

b HITACHI LTD (Japan)

c UNIVERSITY OF TOKUSHIMA (Japan)

Author keywords

Atomic number contrast; Material contrast; Scanning electron microscope; Scanning ion microscope; Secondary electron yield; Secondary electrons

Indexed keywords

ARTICLE;

ATOMS; ELECTRONS; INTELLIGENT SYSTEMS; MONTE CARLO METHODS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION;

ATOMIC NUMBER CONTRAST; ELECTRON MICROSCOPE IMAGES; EXCITED ELECTRONS; MATERIAL CONTRAST; MICROSCOPE IMAGES; SCANNING ELECTRON MICROSCOPE; SCANNING ELECTRONS; SCANNING ION MICROSCOPES; SECONDARY ELECTRON YIELD; SECONDARY ELECTRONS;

IONS;

EID: 0036371167 PISSN: 00220744 EISSN: None Source Type: Journal
DOI: 10.1093/jmicro/51.4.207 Document Type: Article

Times cited : (27)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.