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Surface and Coatings Technology

Volumn 158-159, Issue , 2002, Pages 8-13

Target material dependence of secondary electron images induced by focused ion beams

(2) Ohya, K a Ishitani, T b

a UNIVERSITY OF TOKUSHIMA (Japan)

b HITACHI HIGH TECHNOLOGIES CORPORATION (Japan)

Author keywords

Focused ion beam; Ion induced secondary electron emission; Material dependence; Monte Carlo simulation; Scanning ion microscopy

Indexed keywords

ELECTRIC EXCITATION; ENERGY DISSIPATION; HEAVY IONS; IMAGE ANALYSIS; ION BEAMS; SCANNING ELECTRON MICROSCOPY; TARGETS;

SCANNING ION MICROSCOPY (SIM); SECONDARY ELECTRON IMAGES;

SECONDARY EMISSION;

MONTE CARLO SIMULATION;

EID: 0036394280 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00196-2 Document Type: Article

Times cited : (23)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.