Etching of (Ba,Sr)TiO3 film by chlorine plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2080-2084

  Shibano, Teruo ^a   Takenaga, Takashi ^a   Nakamura, Keisuke ^a   Oomori, Tatsuo ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BARIUM COMPOUNDS; PLASMA ETCHING; REACTIVE ION ETCHING; THERMAL EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL ENHANCEMENT;

DIELECTRIC FILMS;

EID: 0034273946     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286026     Document Type: Article

References (8)

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