Highly-reproducible preparation of Pb(Zr, Ti)O3 films at low deposition temperature by metal organic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 5 A, 2003, Pages 2801-2804

  Asano, Gouji ^a   Oikawa, Takahiro ^a   Funakubo, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ferroelectricity; Low pressure deposition; Low temperature deposition; Polyorystalline; Pulsed MOCVD; PZT

Indexed keywords

EVAPORATION; FERROELECTRICITY; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLARIZATION; THIN FILMS;

REMANENT POLARIZATION;

POLYCRYSTALLINE MATERIALS;

EID: 0038042517     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.2801     Document Type: Article

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