Lead-zirconate-titanate thin films deposited on silicon using a novel technique at low temperature

Applied Surface Science

Volumn 148, Issue 3, 1999, Pages 137-141

  Zeng, Jianming ^a   Zhang, Miao ^a   Song, Zhitang ^a   Wang, Lianwei ^a   Li, Jinhua ^b   Li, Kun ^b   Lin, Chenglu ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b Jiansu Inst Petrochem T   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; LEAD COMPOUNDS; LOW TEMPERATURE OPERATIONS; MORPHOLOGY; MULTILAYERS; OXIDES; PHASE COMPOSITION; SILICON; SOL-GELS; SURFACES; X RAY DIFFRACTION ANALYSIS;

FERROELECTRIC THIN FILMS; LEAD ZIRCONATE TITANATE; PEROVSKITE PHASE; POLYCRYSTALLINE STRUCTURE; SOL-GEL HYDROTHERMAL; SPREADING RESISTIVITY PROCESSING;

THIN FILMS;

EID: 0032652503     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00221-4     Document Type: Article

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