Impact of the loading effect on CD control in plasma etching of Cr photomasks using ZEP7000 resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 429-437

  Chen, F ^a   Tsai, W ^a   Chegwidden, S ^a   Yu, S ^a   Kamna, M ^a   Farnsworth, J ^a   Coleman, T ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; INTEGRATED CIRCUIT MANUFACTURE; PHOTORESISTS; PLASMA ETCHING; REACTIVE ION ETCHING;

ETCH MICROLOADING;

MASKS;

EID: 0032287975     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332864     Document Type: Conference Paper

References (8)