Cr absorber mask for extreme ultraviolet lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 774-780

  Zhang, G ^a   Yan, P Y ^a   Liang, T ^a  

^a INTEL CORPORATION   (United States)

Author keywords

EUVL; Photomask

Indexed keywords

CHROMIUM PLATING; MULTILAYERS; PHOTOLITHOGRAPHY; PLASMA ETCHING; SILICA; SILICON WAFERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY;

MASKS;

EID: 0035051612     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410675     Document Type: Conference Paper

References (6)

1. EUV mask absorber characterization and selection
2. Multilayer reflective coatings for extreme-ultraviolet lithography
3. Thermal stability of Mo/Si multilayers
4. Recent advances in the Sandia EUV 10x microstepper
5. EUV optical design for a 100 nm CD imaging system