High NA swing curve effects

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1050-1057

  Brunner, T A ^a   Gabor, A H ^a   Wu, C J ^a   Chen, N ^a  

^a IBM   (United States)

Author keywords

Interference; Lithography simulation; Optical lithography; Process control; Swing curve; Thin film optics

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; LIGHT INTERFERENCE; OPTICAL FILMS; PROCESS CONTROL; THIN FILMS;

OPTICAL THIN FILMS;

PHOTOLITHOGRAPHY;

EID: 0035758715     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435726     Document Type: Conference Paper

References (7)

1. T.A. Brunner, "Optimization of optical properties of photoresist processes", SPIE Microlithography Symposium, SPIE 1466 p. 297 (San Jose, CA, March 2, 1991).
2. C.A. Mack, "Analytical expression for the standing wave intensity in photoresist", Applied Optics, 25, p. 1958 (1986).
3. H.J. Levinson and W.H. Arnold, "Optical Lithography", Chapter 1 in Handbook of Microlithography, micromachining, and microfabrication: Volume 1: Microlithography, Edited by P. Rai-Choudhury, SPIE Press, pp. 42-56 (1997).
4. H.A. Macleod, Thin-film optical filters, Second Edition, McGraw-Hill, New York, Chapter 2, pp. 11-60 (1986).
5. PROLITH/2™, version 6.1.2, available from FINLE Division of KLA-Tencor, Austin, TX.
6. C.A. Mack and C-B. Juang, "Comparison of scalar and vector modeling of image formation in photoresist", SPIE 2440, (1995).
7. H.S. Kim et al., "Effects of resist thickness and substrate reflectance on CD bias of Isolated-Dense pattern", Jpn. J. Appl. Phys. 38, pp. 724-728 (1999).