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Volumn 426-432, Issue 3, 2003, Pages 2243-2248
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Molecular dynamic simulation of AFM-based nano lithography process for fabrication of MEMS components
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Author keywords
AFM; MEMS; Molecular Dynamics Simulation; Morse Potential; Nano Lithography
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
COMPUTER SIMULATION;
COPPER;
CRYSTAL ORIENTATION;
CRYSTALS;
CUTTING;
DEFORMATION;
LITHOGRAPHY;
MACHINING;
MOLECULAR DYNAMICS;
NANOSTRUCTURED MATERIALS;
SURFACE QUALITY;
MICROELECTROMECHANICAL DEVICES;
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EID: 0037663315
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.426-432.2243 Document Type: Conference Paper |
Times cited : (7)
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References (21)
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