Performance improvement in e-beam reticle writer HL-800M

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 72-83

  Satoh, Hidetoshi ^a   Someda, Yasuhiro ^a   Saitou, Norio ^a   Kawasaki, Katsuhiro ^a   Mizuno, Ka zui ^a   Kadowaki, Yasuhiro ^a   Hoga, Morihisa ^a   Soga, Takashi ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PERFORMANCE; PROXIMITY SENSORS; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY;

CRITICAL DIMENSIONS; PROXIMITY EFFECT CORRECTION; RETICLES;

ELECTRON BEAM LITHOGRAPHY;

EID: 0031374883     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277297     Document Type: Conference Paper

References (6)