Preliminary evaluation of proximity and resist heating effects observed in high acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 115-125

  Kuwahara, N ^a   Nakagawa, H ^a   Kurihara, M ^a   Hayashi, N ^a   Sano, H ^a   Maruta, E ^a   Takikawa, T ^a   Noguchi, S ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; HEATING; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTOMASKS; RESIST HEATING EFFECTS;

MASKS;

EID: 0032684806     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (9)