Fogging effect compensation technique for photomask making

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 188-199

  Nozaki, Yuji ^a   Tanaka, Toshiyuki ^a   Takushima, Katsuhiro ^a   Suzuki, Seki ^a   Endo, Akihiro ^a   Sogo, Kohei ^a   Kimura, Yasuki ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INTEGRATED CIRCUIT MANUFACTURE; NUMERICAL METHODS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSION DISPARITY; CRITICAL DIMENSION UNIFORMITY; DESCUM; FOGGING EFFECT; PHOTOMASK MAKING; SIDE WALL ANGLE DEPENDENCE;

MASKS;

EID: 0033666532     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392057     Document Type: Conference Paper

References (2)