Proximity effect correction for reticle fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 180-187

  Sugiyama, Masao ^a   Kubo, Shinji ^a   Hiruta, Kouji ^a   Iwamatsu, Takayuki ^a   Fujisawa, Tatsuya ^a   Morimoto, Hiroaki ^a  

^a Technologies Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; CHROMIUM; CURRENT DENSITY; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; ELECTRON SCATTERING; INTEGRATED CIRCUIT MANUFACTURE; PHOTORESISTS; QUARTZ; SUBSTRATES; TEMPERATURE DISTRIBUTION;

CHEMICALLY AMPLIFIED RESIST; CRITICAL DIMENSION; ELECTRON BEAM MASK WRITER; POST EXPOSURE BAKE; PROXIMITY EFFECT CORRECTION; RETICLE FABRICATION;

MASKS;

EID: 0033670899     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392056     Document Type: Conference Paper

References (2)