Temperature programmed desorption study of Zr-diethylamido precursor for ZrO2 CVD

Journal of Crystal Growth

Volumn 254, Issue 1-2, 2003, Pages 65-69

  Jeong, Joonhee ^a   Yong, Kijung ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

A1. Adsorption; A1. Desorption; A1. Surfaces; A3. Chemical vapor deposition processes

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; MONOLAYERS; TEMPERATURE PROGRAMMED DESORPTION; ZIRCONIA;

LIGANDS;

THIN FILMS;

EID: 0037609786     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)01114-X     Document Type: Article

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