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Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 607-611

Infrared study of chemistry of Si surfaces in etching solution

(4) Niwano, Michio a Miura, Taka Aki a Tajima, Ryo a Miyamoto, Nobuo a

a TOHOKU UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL MODIFICATION; ETCHING; HYDROFLUORIC ACID; SEMICONDUCTING SILICON; SURFACE PROPERTIES; SURFACE TREATMENT; SURFACES;

INFRARED ABSORPTION SPECTROSCOPY; MULTIPLE INTERNAL REFLECTION GEOMETRY;

INFRARED SPECTROSCOPY;

EID: 0030564481 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(96)00348-0 Document Type: Article

Times cited : (6)

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