Study of cobalt silicides formation in Co/Ta-W/Si(100) multilayer systems

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 298-304

  Moshfegh, A Z ^a   Hashemifar, S J ^b   Akhavan, O ^a   Azimirad, R ^a  

^a SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

^b ISFAHAN UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

Barrier layer; CoSi2; Silicidation; Ta W

Indexed keywords

ANNEALING; EVAPORATION; MULTILAYERS; SILICON; SINGLE CRYSTALS; SPUTTERING; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

SILCIDATION;

COBALT COMPOUNDS;

EID: 0037601781     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00300-6     Document Type: Conference Paper

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