Thermal evolution of chemical oxides and (100) silicon at 300°C in ambient air as seen by attenuated total reflection infrared spectroscopy

Journal of the Electrochemical Society

Volumn 150, Issue 6, 2003, Pages

  Tardif, F ^a   Chabli, A ^a   Danel, A ^a   Rochat, N ^a   Veillerot, M ^a  

^a CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; OXIDATION; SURFACE TREATMENT; THERMODYNAMIC PROPERTIES; WETTING;

ATTENUATED TOTAL REFLECTION INFRARED SPECTROSCOPY; CHEMICAL OXIDE; SILANOL;

SILICON;

EID: 0037593999     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1567269     Document Type: Article

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