-
2
-
-
24544455171
-
Magnetic properties of granular nickel films
-
Gittleman J.I., Goldstein Y., Bozowski S. Magnetic properties of granular nickel films. Phys. Rev. B. 5:(9):1972;3609-3621.
-
(1972)
Phys. Rev. B
, vol.5
, Issue.9
, pp. 3609-3621
-
-
Gittleman, J.I.1
Goldstein, Y.2
Bozowski, S.3
-
3
-
-
0001221344
-
Tunneling of spin-polarized electrons and magnetoresistance in granular Ni films
-
Helman J.S., Abeles B. Tunneling of spin-polarized electrons and magnetoresistance in granular Ni films. Phys. Rev. Lett. 37:(21):1976;1429-1432.
-
(1976)
Phys. Rev. Lett.
, vol.37
, Issue.21
, pp. 1429-1432
-
-
Helman, J.S.1
Abeles, B.2
-
4
-
-
0001405027
-
Magnetic and transport properties of granular cobalt films
-
Barzilai S., Goldstein Y., Balberg I., Helman J.S. Magnetic and transport properties of granular cobalt films. Phys. Rev. B. 23:(4):1981;1809-1817.
-
(1981)
Phys. Rev. B
, vol.23
, Issue.4
, pp. 1809-1817
-
-
Barzilai, S.1
Goldstein, Y.2
Balberg, I.3
Helman, J.S.4
-
5
-
-
0029291449
-
Tunnel-type GMR in metal-nonmetal granular alloy thin films
-
Fujimori H., Mitani S., Ohnuma S. Tunnel-type GMR in metal-nonmetal granular alloy thin films. Mater. Sci. Engng, B. 31:1995;219-223.
-
(1995)
Mater. Sci. Engng, B
, vol.31
, pp. 219-223
-
-
Fujimori, H.1
Mitani, S.2
Ohnuma, S.3
-
6
-
-
0035131103
-
Selective deposition of thin copper films onto silicon with improved adhesion
-
Magagnin L., Maboudian R., Carraro C. Selective deposition of thin copper films onto silicon with improved adhesion. Electrochem. Solid-State Lett. 4:(1):2001;C5-C7.
-
(2001)
Electrochem. Solid-State Lett.
, vol.4
, Issue.1
-
-
Magagnin, L.1
Maboudian, R.2
Carraro, C.3
-
7
-
-
0001352127
-
Local deposition of gold on silicon by the scanning electrochemical microscope
-
Ammann E., Mandler D. Local deposition of gold on silicon by the scanning electrochemical microscope. J. Electrochem. Soc. 148:(8):2001;C533-C539.
-
(2001)
J. Electrochem. Soc.
, vol.148
, Issue.8
-
-
Ammann, E.1
Mandler, D.2
-
8
-
-
0032669507
-
Mechanism of the chemical deposition of nickel on silicon wafers in aqueous solution
-
Takano N., Hosoda N., Yamada T., Osaka T. Mechanism of the chemical deposition of nickel on silicon wafers in aqueous solution. J. Electrochem. Soc. 146:(4):1999;1407-1411.
-
(1999)
J. Electrochem. Soc.
, vol.146
, Issue.4
, pp. 1407-1411
-
-
Takano, N.1
Hosoda, N.2
Yamada, T.3
Osaka, T.4
-
9
-
-
0032691679
-
Effect of oxidized silicon surface on chemical deposition of nickel on n-type silicon wafer
-
Takano N., Hosoda N., Yamada T., Osaka T. Effect of oxidized silicon surface on chemical deposition of nickel on n-type silicon wafer. Electrochim. Acta. 44:1999;3743-3749.
-
(1999)
Electrochim. Acta
, vol.44
, pp. 3743-3749
-
-
Takano, N.1
Hosoda, N.2
Yamada, T.3
Osaka, T.4
-
10
-
-
0034206741
-
Electrochemistry of gold deposition on n-Si(100)
-
Oskam G., Searson P.C. Electrochemistry of gold deposition on n-Si(100). J. Electrochem. Soc. 147:(6):2000;2199-2205.
-
(2000)
J. Electrochem. Soc.
, vol.147
, Issue.6
, pp. 2199-2205
-
-
Oskam, G.1
Searson, P.C.2
-
11
-
-
0000095331
-
Spectroscopic studies on electroless deposition of copper on a hydrogen-terminated Si(111) surface in fluoride solutions
-
Ye S., Ichihara T., Uosaki K. Spectroscopic studies on electroless deposition of copper on a hydrogen-terminated Si(111) surface in fluoride solutions. J. Electrochem. Soc. 148:(6):2001;C421-C426.
-
(2001)
J. Electrochem. Soc.
, vol.148
, Issue.6
-
-
Ye, S.1
Ichihara, T.2
Uosaki, K.3
-
12
-
-
0037085220
-
Ni dot array formation on scratches of Si(111) by electroless deposition
-
Kim C., Oikawa Y., Shin J., Ozaki H. Ni dot array formation on scratches of Si(111) by electroless deposition. Jpn. J. Appl. Phys., Part 2. 41:(2B):2002;L178-L179.
-
(2002)
Jpn. J. Appl. Phys., Part 2
, vol.41
, Issue.2 B
-
-
Kim, C.1
Oikawa, Y.2
Shin, J.3
Ozaki, H.4
-
13
-
-
11644297902
-
Nucleation of trace copper on the H-Si(111) surface in aqueous fluoride solutions
-
Homma T., Wade C.P., Chidsey C.E.D. Nucleation of trace copper on the H-Si(111) surface in aqueous fluoride solutions. J. Phys. Chem., B. 102:(41):1998;7919-7923.
-
(1998)
J. Phys. Chem., B
, vol.102
, Issue.41
, pp. 7919-7923
-
-
Homma, T.1
Wade, C.P.2
Chidsey, C.E.D.3
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