SiO2 electret thin films prepared by various deposition methods

Thin Solid Films

Volumn 426, Issue 1-2, 2003, Pages 47-52

  Minami, Tadatsugu ^a   Utsubo, Tetsuharu ^a   Yamatani, Tsuyoshi ^a   Miyata, Toshihiro ^a   Ohbayashi, Yoshiaki ^b  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b Hosiden Corporation   (Japan)

Author keywords

Arc plasma evaporation; Electret; Electron cyclotron resonance; Magnetron sputtering; MOCVD; Postannealing; Silicon dioxide; Thin film

Indexed keywords

ELECTRETS; ELECTRON CYCLOTRON RESONANCE; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; THIN FILMS; VACUUM APPLICATIONS;

POSTANNEALING; VACUUM ARC PLASMA EVAPORATION (VAPE);

SILICA;

EID: 0037463262     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01302-0     Document Type: Article

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