Fabrication of Silicon Dioxide Electrets by Plasma CVD Process for Microsystemsand Evaluation of Their Long-Term Charge Stability

IEICE Transactions on Electronics

Volumn E80-C, Issue 1, 1997, Pages 174-182

  Ichiya, Mitsuo ^a   Nakamura, Takuro ^a   Nakatatt, Shuji ^a   Lewinerttt, Jacques ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC SPACE CHARGE; INDUCED CURRENTS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS; SILICA;

CHARGE STABILITY; PLASMA CHEMICAL VAPOR DEPOSITION (PCVD); THERMALLY STIMULATED CURRENT (TSC);

ELECTRETS;

EID: 0030673735     PISSN: 09168524     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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2. J. LewinerD. PerinoH. NishimuraF. Kasanoand M. IchiyaElectrostatic relay with electret by using micromachining techniquesProc. 17th International Conference on Electrical Contactspp. 193-2021994.
3. M. IchiyaH. NishimuraF. KasanoJ. Lewinerand D. PerinoElectrostatic actuator with electretIEICE Trans. Electro.vol. E78-C no. 2pp. 128-1311995.
4. P. GüntherCharginglong-term stabilityand TSD measurement of SiO2 electrets IEEE Trans. Electr. Insul.vol.24pp. 439-4421989.
5. X. Zhongfu and P. GüntherSilicondioxide electret films prepared by sol-gel processIEEE Trans. Electr. Insul.vol.1pp. 31-371994.
6. M. IchiyaT. NakamuraS. Nakataand J. LewinerThe long-term charge storage mechanism of silicon dioxide electrets for microsystemsIEICE Trans. Electronvol. E79-Cno. 10pp. 1462-14661996.