Properties of vacuum-deposited polyimide films

Vacuum

Volumn 70, Issue 1, 2003, Pages 37-45

  Danev, G ^a   Spassova, E ^a   Assa, J ^a   Karamancheva, I ^b   Paskaleva, A ^c   Popova, K ^d   Ihlemann, J ^e  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

^b UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY   (Bulgaria)

^c INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^d Laser and Optical Technologies   (Bulgaria)

^e LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

Dry etching; Laser structuring; Morphology; Polyimide; Thin films; Vacuum deposition

Indexed keywords

CHEMICAL RESISTANCE; ELECTRIC PROPERTIES; LASER BEAM EFFECTS; MICROSTRUCTURE; MORPHOLOGY; REACTIVE ION ETCHING; VACUUM APPLICATIONS;

VACUUM DEPOSITION;

THIN FILMS;

EID: 0037458761     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00679-6     Document Type: Article

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