Thin polyimide layers - Preparation and properties

Vacuum

Volumn 51, Issue 2, 1998, Pages 185-188

  Assa, J ^a   Spassova, E ^a   Karamancheva, I ^b   Dimitrova, T ^c   Rangelov, N ^a   Danev, G ^a  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

^b UNIVERSITY OF CHEMICAL TECHNOLOGY AND METALLURGY   (Bulgaria)

^c BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONDENSATION; FILM GROWTH; FILM PREPARATION; HEAT TREATMENT; MICROHARDNESS; MONOMERS; POLYIMIDES; REACTIVE ION ETCHING; THIN FILMS; VACUUM TECHNOLOGY;

IMIDIZATION;

PLASTIC FILMS;

EID: 0032184111     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00156-0     Document Type: Article

References (7)

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3. Takahashi, Y., Iijima, M., Inagawa, K. and Itoh, A., J. Vac. Sci. Technol. A, 1987, 5, 2253.
4. Kowalczyk, S. P., Dimitracopoulos, C. D. and Molis, S. E., Mater. Res. Soc. Symp. Proc., 1991, 227, 55.
5. Hutchings, C. W. and Grunze, M., Rev. Sci. Instrum., 1995, 66, 3943.
6. Gardner, H. A. and Sward, G. G., Physical and Chemical Examinations, 12th edn. Gardner Laboratories, Bethseda, MD, 1962, p. 129.
7. Assa, J., J. Inf. Rec. Mats., 1995, 22, 265.