'All-dry' and in situ microstructuring of carbide/polyimide layers

Vacuum

Volumn 48, Issue 1, 1997, Pages 63-67

  Danev, G ^a   Spassova, E ^a   Petkov, K ^a   Assa, J ^a   Ihleman, J ^b   Wolf Rottke, B ^b  

^a CENTRAL LABORATORY OF PHOTOPROCESSES   (Bulgaria)

^b LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; EXCIMER LASERS; LASER APPLICATIONS; LITHOGRAPHY; MICROELECTRONIC PROCESSING; POLYIMIDES; REACTIVE ION ETCHING; VACUUM TECHNOLOGY;

ALL DRY RESIST SYSTEM; IN SITU MICROSTRUCTURING;

THICK FILMS;

EID: 0030735643     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(96)00231-x     Document Type: Article

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