In situ and ex situ AFM investigation of the formation of octadecylsiloxane monolayers

Applied Surface Science

Volumn 140, Issue 1-2, 1999, Pages 168-175

  Resch, R ^a   Grasserbauer, M ^a   Friedbacher, G ^a   Vallant, Th ^a   Brunner, H ^a   Mayer, U ^a   Hoffmann, H ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Atomic force microscopy; In situ measurements; Octadecylsiloxane; Self assembled monolayers (SAM)

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; ORGANIC SOLVENTS; SILICON COMPOUNDS;

ALKYLSILOXANES; SELF ASSEMBLED MONOLAYERS;

MONOLAYERS;

EID: 0033076359     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00585-6     Document Type: Article

References (34)

1. A. Ulman, An Introduction to Ultrathin Organic Films, Academic Press, San Diego, 1991.
2. Ulman A. Chem. Rev. 96:1996;1533.
3. Nuzzo R.G., Allara D.L. J. Am. Chem. Soc. 105:1983;4481.
4. Troughten E., Whitesides G., Allara D., Porter M. Langmuir. 4:1988;365.
5. Demoz A., Harrison D.J. Langmuir. 9:1993;1046.
6. Schlotter N., Porter M., Bright T., Allara D. Chem. Phys. Lett. 132:1986;93.
7. Allara D., Nuzzo R. Langmuir. 1:1985;45.
8. Maoz R., Sagiv J. J. Colloid Interface Sci. 100:1984;465.
9. Hoffmann H., Mayer U., Krischanitz A. Langmuir. 11:1995;1304.
10. Carson G., Granick S. Appl. Spectrosc. 43:1989;473.
11. Kessel C.R., Granick S. Langmuir. 7:1991;532.
12. Tillman N., Ulman A., Schildkraut J.S., Penner T.L. J. Am. Chem. Soc. 110:1988;6136.
13. Lee H., Kepley L., Hong H., Mallouk T. J. Am. Chem. Soc. 110:1988;618.
14. Lee H., Kepley L., Hong H., Akhter S., Mallouk T. J. Phys. Chem. 92:1988;2597.
15. Vallant Th., Brunner H., Mayer U., Hoffmann H. Langmuir. 14:1998;5826.
16. Tripp C.P., Hair M.L. Langmuir. 8:1992;1120.
17. Tripp C.P., Hair M.L. Langmuir. 8:1992;1961.
18. Laibinis P.E., Whitesides G.M., Allara D.L., Tao Y.T., Parikh A.N., Nuzzo R.G. J. Am. Chem. Soc. 113:1991;7153.
19. Brunner H., Mayer U., Hoffmann H. Appl. Spectrosc. 51:1997;209.
20. Bierbaum K., Kinzler M., Wöll Ch., Grunze M., Hähner G., Heid S., Effecberger F. Langmuir. 11:1995;512.
21. Hähner G., Wöll Ch., Buck M., Grunze M. Langmuir. 9:1993;1955.
22. R. Maoz, R. Yam, G. Berkovic, J. Sagiv, in: A. Ulman (Ed.), Thin Films, Vol. 20, Academic Press, New York, 1995.
23. Maoz R., Sagiv J., Degenhardt D., Möhwald H., Quint P. Supramol. Sci. 2:1995;9.
24. Chidsey C., Liu G., Rowntree Y., Scoles G. J. Chem. Phys. 91:1989;4421.
25. Camillone N., Chidsey C., Eisenberger P., Fenter P. J. Chem. Phys. 99:1993;744.
26. Fenter P., Eisenberger P., Liang K. Phys. Rev. Lett. 70:1993;2447.
27. Nuzzo R.G., Allara D.L. J. Am. Chem. Soc. 105:1983;4481.
28. Tillman N., Ulman A., Penner T.L. Langmuir. 5:1989;101.
29. Widrig C., Alves C., Porter M. J. Am. Chem. Soc. 113:1991;2805.
30. Alves C., Porter M., Smith E. J. Am. Chem. Soc. 114:1992;1222.
31. Kim Y., Bard A. Langmuir. 8:1992;1096.
32. Friedbacher G., Prohaska T., Grasserbauer M. Mikrochim. Acta. 113:1994;179.
33. Vallant Th., Brunner H., Mayer U., Hoffmann H., Leitner T., Resch R., Friedbacher G. J. Phys. Chem. 102:1998;7190.
34. Th. Vallant, H. Brunner, U. Mayer, H. Hoffmann, B. Basnar, M. Vallant, G. Friedbacher, Langmuir, submitted.