Luminescence of erbium-implanted dielectric films

Thin Solid Films

Volumn 425, Issue 1-2, 2003, Pages 171-174

  Lu, F ^a   Carius, R ^a   Alam, A ^b   Heuken, M ^b   Rizzi, A ^a   Buchal, Ch ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b AIXTRON AG   (Germany)

Author keywords

Aluminium nitride; Erbium; Implantation

Indexed keywords

ALUMINUM NITRIDE; ELECTROLUMINESCENCE; ERBIUM; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; POLYCRYSTALLINE MATERIALS; SILICON; SUBSTRATES; THIN FILMS;

CHEMICAL STABILITY;

DIELECTRIC FILMS;

EID: 0037415937     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01111-2     Document Type: Article

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