Upconversion in Er-implanted Al2O3 waveguides

Journal of Applied Physics

Volumn 79, Issue 3, 1996, Pages 1258-1266

  Van Den Hoven, G N ^b   Snoeks, E ^a,b   Polman, A ^b   Van Dam, C ^c   Van Uffelen, J W M ^c   Smit, M K ^c  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b FOM INSTITUTE AMOLF   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ALUMINA; CALCULATIONS; ELECTRON ENERGY LEVELS; ERBIUM; ION IMPLANTATION; LIGHT AMPLIFIERS; PHOTOLUMINESCENCE; PROBABILITY; PUMPING (LASER); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR LASERS;

EXCITED STATE ABSORPTION; LUMINESCENCE DECAY; PAIR INDUCED QUENCHING; PUMP INTENSITY; UPCONVERSION MECHANISMS;

OPTICAL WAVEGUIDES;

EID: 0030080953     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361020     Document Type: Article

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