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Applied Physics Letters

Volumn 77, Issue 14, 2000, Pages 2177-2179

Improvement of the thermal stability of NiSi films by using a thin Pt interlayer

(4) Liu, J F a Chen, H B a Feng, J Y a Zhu, J a

a TSINGHUA UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001390971 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1313815 Document Type: Article

Times cited : (54)

References (15)

1
- 0031996507
- J. P. Gambino and E. G. Colgan, Mater. Chem. Phys. 52, 99 (1998).
- (1998) Mater. Chem. Phys. , vol.52 , pp. 99
- Gambino, J.P.¹ Colgan, E.G.²

2
- 0001188981
- F. Deng, R. A. Johnson, P. M. Asbeck, S. S. Lau, W. B. Dubbelday, T. Hsiao, and J. Woo, J. Appl. Phys. 81, 8047 (1997).
- (1997) J. Appl. Phys. , vol.81 , pp. 8047
- Deng, F.¹ Johnson, R.A.² Asbeck, P.M.³ Lau, S.S.⁴ Dubbelday, W.B.⁵ Hsiao, T.⁶ Woo, J.⁷

3
- 0031191779
- J. Chen, J. P. Colinge, D. Flandre, R. Gillon, J. P. Raskin, and D. Vanhoenacker, J. Electrochem. Soc. 144, 2437 (1997).
- (1997) J. Electrochem. Soc. , vol.144 , pp. 2437
- Chen, J.¹ Colinge, J.P.² Flandre, D.³ Gillon, R.⁴ Raskin, J.P.⁵ Vanhoenacker, D.⁶

4
- 0028743070
- T. Ohguro, S. Nakajima, M. Koike, T. Morimoto, A. Nishiyama, Y. Ushiku, T. Yoshilomi, M. Saito, and H. Iwai, IEEE Trans. Electron Devices 41, 2305 (1994).
- (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2305
- Ohguro, T.¹ Nakajima, S.² Koike, M.³ Morimoto, T.⁴ Nishiyama, A.⁵ Ushiku, Y.⁶ Yoshilomi, T.⁷ Saito, M.⁸ Iwai, H.⁹

5
- 0344462733
- B. A. Julies, D. Knoesen, R. Pretorius, and D. Adams, Thin Solid Films 347, 201 (1999).
- (1999) Thin Solid Films , vol.347 , pp. 201
- Julies, B.A.¹ Knoesen, D.² Pretorius, R.³ Adams, D.⁴

6
- 0001723509
- D. Mangelinck, P. Gas, A. Grob, B. Pichard, and O. Thomas, J. Appl. Phys. 79, 4078 (1996).
- (1996) J. Appl. Phys. , vol.79 , pp. 4078
- Mangelinck, D.¹ Gas, P.² Grob, A.³ Pichard, B.⁴ Thomas, O.⁵

7
- 0032157147
- M. C. Poon, C. H. Ho, F. Deng, S. S. Lau, and H. Wong, Microelectron. Reliab. 38, 1495 (1998).
- (1998) Microelectron. Reliab. , vol.38 , pp. 1495
- Poon, M.C.¹ Ho, C.H.² Deng, F.³ Lau, S.S.⁴ Wong, H.⁵

8
- 0032157593
- M. C. Poon, M. Chan, W. Q. Zhang, F. Deng, and S. S. Lau, Microelectron. Reliab. 38, 1499 (1998).
- (1998) Microelectron. Reliab. , vol.38 , pp. 1499
- Poon, M.C.¹ Chan, M.² Zhang, W.Q.³ Deng, F.⁴ Lau, S.S.⁵

9
- 0033361221
- L. W. Cheng, S. L. Chang, J. Y. Chen, L. J. Chen, and B. Y. Tsui, Thin Solid Films 356, 412 (1999).
- (1999) Thin Solid Films , vol.356 , pp. 412
- Cheng, L.W.¹ Chang, S.L.² Chen, J.Y.³ Chen, L.J.⁴ Tsui, B.Y.⁵

10
- 0033879707
- C. J. Tsai, P. L. Chung, and K. H. Yu, Thin Solid Films 365, 72 (2000).
- (2000) Thin Solid Films , vol.365 , pp. 72
- Tsai, C.J.¹ Chung, P.L.² Yu, K.H.³

11
- 0033893273
- M. C. Poon, F. Deng, M. Chan, W. Y. Chan, and S. S. Lau, Appl. Surf. Sci. 157, 29 (2000).
- (2000) Appl. Surf. Sci. , vol.157 , pp. 29
- Poon, M.C.¹ Deng, F.² Chan, M.³ Chan, W.Y.⁴ Lau, S.S.⁵

12
- 0032620901
- D. Mangelinck, J. Y. Dai, J. S. Pan, and S. K. Lahiri, Appl. Phys. Lett. 75, 1736 (1999).
- (1999) Appl. Phys. Lett. , vol.75 , pp. 1736
- Mangelinck, D.¹ Dai, J.Y.² Pan, J.S.³ Lahiri, S.K.⁴

13
- 0347721212
- JCPDS, 38-844 (1988).
- (1988) JCPDS , pp. 38-844

14
- 0345829389
- JCPDS, 7-251 (1988).
- (1988) JCPDS , pp. 7-251

15
- 0004329417
- INSPEC, London
- K. Maex and M. Van Rossum, Properties of Metal Silicides 1st ed. (INSPEC, London, 1995).
- (1995) Properties of Metal Silicides 1st Ed.
- Maex, K.¹ Van Rossum, M.²

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