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Journal of Crystal Growth

Volumn 198-199, Issue pt 2, 1999, Pages 1235-1239

Optical properties of thin CVD-tungsten oxide films by spectroscopic ellipsometry

(3) Szekeres, A a Gogova, D b Gesheva, K b

a INSTITUTE OF SOLID STATE PHYSICS (Bulgaria)

b CTRL LAB SOLAR ENER NEW ENER S (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; ELLIPSOMETRY; OPTICAL PROPERTIES; PYROLYSIS; SILICON; SUBSTRATES; TEMPERATURE; TUNGSTEN COMPOUNDS;

OPTICAL CONSTANTS; PHYSICAL COMPOSITION; POLYCRYSTALLINE STRUCTURE; SPECTROSCOPIC ELLIPSOMETRY; TUNGSTEN OXIDE FILMS; TWO LAYER MODEL;

THIN FILMS;

EID: 0033514531 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(98)00993-2 Document Type: Article

Times cited : (19)

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