Optical constants of thin CVD-tungsten oxide films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3573, Issue , 1998, Pages 200-203

  Szekeres, A ^a   Gogova, D ^b  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b Central Laboratory of Solar Energy and New Energy Sources   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ENERGY GAP; OXIDES; POROSITY; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; TUNGSTEN COMPOUNDS; ULTRATHIN FILMS;

CRYSTALLINE PHASE; DEPOSITED OXIDES; GLASS SUBSTRATES; OPTICAL BAND GAP ENERGY; TUNGSTEN OXIDE; TUNGSTEN OXIDE FILMS; WAVELENGTH RANGES;

OXIDE FILMS;

EID: 0042519830     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.321009     Document Type: Conference Paper

References (9)

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