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Volumn 47, Issue 4, 2003, Pages 695-698

High performance 12 GHz enhancement-mode pseudomorphic HEMT prepared by He plus reactive ion etching

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; ION BOMBARDMENT; REACTIVE ION ETCHING; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM ARSENIDE; SPURIOUS SIGNAL NOISE; TRANSCONDUCTANCE;

EID: 0037394295     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(02)00317-9     Document Type: Article
Times cited : (4)

References (12)
  • 1
    • 0031101135 scopus 로고    scopus 로고
    • Self-aligned pseudomorphic HEMT with a low-temperature-grown GaAs gate insulator
    • Chen C.L., Mahoney L.J., Calawa S.D., Molvar K.M., Calawa A.R. Self-aligned pseudomorphic HEMT with a low-temperature-grown GaAs gate insulator. Electron. Lett. 33:1997;640-642.
    • (1997) Electron Lett , vol.33 , pp. 640-642
    • Chen, C.L.1    Mahoney, L.J.2    Calawa, S.D.3    Molvar, K.M.4    Calawa, A.R.5
  • 2
    • 0033341408 scopus 로고    scopus 로고
    • E-PHEMT for single supply, no drain switch, and high efficiency cellular telephone power amplifiers GaAs IC Symposium, 1999
    • Tkachenko Y, Klimashov A, Wei C, Zhao Y, Bartle D. E-PHEMT for single supply, no drain switch, and high efficiency cellular telephone power amplifiers GaAs IC Symposium, 1999. 21st Annual, 1999. p. 127-30.
    • (1999) 21st Annual, 1999 , pp. 127-130
    • Tkachenko, Y.1    Klimashov, A.2    Wei, C.3    Zhao, Y.4    Bartle, D.5
  • 4
    • 0013164413 scopus 로고    scopus 로고
    • 0.78As heterojunction field effect transistor using citric acid/hydrogen peroxide/ammonium hydroxide for power application
    • 0.78As heterojunction field effect transistor using citric acid/hydrogen peroxide/ammonium hydroxide for power application. J. Vac. Sci. Technol. B. 16:1998;2675-2679.
    • (1998) J Vac Sci Technol B , vol.16 , pp. 2675-2679
    • Hue, X.1    Boudart, B.2    Crosnier, Y.3
  • 7
    • 0018441483 scopus 로고
    • Plasma etching - Discussion of mechanisms
    • Coburn J.W., Winters H.F. Plasma etching. - discussion of mechanisms J. Vac. Sci. Technol. 16:1979;391.
    • (1979) J Vac Sci Technol , vol.16 , pp. 391
    • Coburn, J.W.1    Winters, H.F.2
  • 8
    • 0029638947 scopus 로고
    • Enhancement-mode buried gate InGaP/AlGaAs heterojunction FETs fabricated by selective wet etching
    • Okamoto Y., Matsunaga K., Kuzuhara M. Enhancement-mode buried gate InGaP/AlGaAs heterojunction FETs fabricated by selective wet etching. Electron. Lett. 31:1995;2216-2218.
    • (1995) Electron Lett , vol.31 , pp. 2216-2218
    • Okamoto, Y.1    Matsunaga, K.2    Kuzuhara, M.3
  • 10
    • 0028494262 scopus 로고
    • Characterization of new a-Si:H Detectors fabricated from amorphous silicon deposited at high rate by helium enhanced PECVD
    • Pochet T., Illie A., Foulon F., Equer B. Characterization of new a-Si:H Detectors fabricated from amorphous silicon deposited at high rate by helium enhanced PECVD. IEEE Trans. Nucl. Sci. 41(4):1994;1014-1018.
    • (1994) IEEE Trans Nucl Sci , vol.41 , Issue.4 , pp. 1014-1018
    • Pochet, T.1    Illie, A.2    Foulon, F.3    Equer, B.4
  • 11
    • 0035821981 scopus 로고    scopus 로고
    • He plus remote plasma nitridation of ultrathin gate oxide for deep submicron CMOS technology applications
    • Ting S.F., Fang Y.K., Chen C.H., Yang C.W., Yu M.C., Jang S.M.et al. He plus remote plasma nitridation of ultrathin gate oxide for deep submicron CMOS technology applications. Electron. Lett. 37(12):2001;788-790.
    • (2001) Electron Lett , vol.37 , Issue.12 , pp. 788-790
    • Ting, S.F.1    Fang, Y.K.2    Chen, C.H.3    Yang, C.W.4    Yu, M.C.5    Jang, S.M.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.