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Volumn 251, Issue 1-4, 2003, Pages 281-284
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Application of multi-step formation during molecular beam epitaxy for fabricating novel nanomechanical structures
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Author keywords
A3. Molecular beam epitaxy; B2. Semiconducting III V materials
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ELECTROMECHANICAL DEVICES;
IMAGING TECHNIQUES;
MOLECULAR BEAM EPITAXY;
SELF ASSEMBLY;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTOR GROWTH;
SEMICONDUCTOR SUPERLATTICES;
MULTI-STEP FORMATION;
NANOSTRUCTURED MATERIALS;
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EID: 0037380494
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(02)02318-7 Document Type: Conference Paper |
Times cited : (1)
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References (17)
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