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Volumn 251, Issue 1-4, 2003, Pages 281-284

Application of multi-step formation during molecular beam epitaxy for fabricating novel nanomechanical structures

Author keywords

A3. Molecular beam epitaxy; B2. Semiconducting III V materials

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROMECHANICAL DEVICES; IMAGING TECHNIQUES; MOLECULAR BEAM EPITAXY; SELF ASSEMBLY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR GROWTH; SEMICONDUCTOR SUPERLATTICES;

EID: 0037380494     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(02)02318-7     Document Type: Conference Paper
Times cited : (1)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.