Effect of N-based gases to C3F8/O2 on global warming during silicon nitride PECVD chamber cleaning using a remote plasma source

Journal of the Korean Physical Society

Volumn 42, Issue SUPPL.2, 2003, Pages

  Kim, J H ^a   Oh, C H ^a   Lee, N E ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

DREs; MMTCE; Remote plasma source; Silicon nitride cleaning

Indexed keywords

EID: 0037310875     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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