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Journal of the Korean Physical Society

Volumn 42, Issue SUPPL.2, 2003, Pages

Soft X-ray sources with a narrow spectral bandwidth based on laser plasmas produced with tin oxide targets

(3) Choi, Il Woo a Daido, Hiroyuki b Suzuki, Masayuki c

a Dongshin University (South Korea)

b JAPAN ATOMIC ENERGY AGENCY (Japan)

c OSAKA UNIVERSITY (Japan)

Author keywords

Extreme ultraviolet lithography; Laser plasma source; Soft X ray emission; Soft X ray projection lithography; Space resolved measurement technique

Indexed keywords

EID: 0037309328 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: None Document Type: Conference Paper

Times cited : (2)

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