Ultra-deep LIGA process

Journal of Micromechanics and Microengineering

Volumn 9, Issue 1, 1999, Pages 58-63

  Cheng, Y ^a   Shew, B Y ^a   Lin, C Y ^a   Wei, D H ^a   Chyu, M K ^b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; IRRADIATION; LOW TEMPERATURE OPERATIONS; MASKS; MICROELECTRONIC PROCESSING; PHOTORESISTS; RESIDUAL STRESSES; SUBSTRATES; THERMAL EXPANSION; THERMAL STRESS; X RAYS;

CONFORMAL MASK TECHNOLOGY; DIE FABRICATION; ULTRA DEEP MICROSTRUCTURE;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0033100796     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/1/307     Document Type: Article

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