Deep X-ray lithography developed at SRRC

Proceedings of the National Science Council, Republic of China, Part A: Physical Science and Engineering

Volumn 23, Issue 4, 1999, Pages 537-543

  Cheng, Yao ^a   Shew, Bor Yuan ^a   Lin, Ching Yao ^a   Wei, Der Hsin ^a  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; SYNCHROTRON RADIATION; THICK FILM DEVICES;

DEEP X-RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0033153953     PISSN: 02556588     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)