Ultra-deep LIGA process and its applications

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 467-468, Issue PART II, 2001, Pages 1192-1197

  Cheng, Y ^a,b   Shew, B Y ^a   Chyu, M K ^c   Chen, P H ^d  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c University of Pittsburgh   (United States)

^d NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Micromachining; Synchrotron radiation; Thick film lithography; Ultra deep LIGA process; Ultra deep X ray lithography

Indexed keywords

EID: 0346981694     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(01)00606-4     Document Type: Article

References (8)

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4. Y. Cheng, N.Y. Kuo, C.H. Su, Rev. Sci. Instr. 68 5 (1997) 2163.
5. Y. Cheng, C.Y. Lin, D.H. Wei, B. Loechel, G. Gruetzner, IEEE J. MEMS, 81(1999) 18.
6. B.-Y. Shew, Y. Cheng, C.-H. Lin, W.-P. Ma, G.-J. Hwang, S.-C. Tseng, C.-L. Kuo, G.-L. Chang, D.-S. Lee, Sensors Mater. 11 (6) (1999) 329.
7. H. Henke, CP398, Advance Accelerator Concepts, S. Chattopadhyay, J. McCullough, P. Dahl (Eds.), AIP press, New York, 1997.
8. P. Wilson, SLAC-PUB-7449.