Preparation of clean InP(100) surfaces studied by synchrotron radiation photoemission

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 1, 2003, Pages 219-225

  Sun, Yun ^a,b   Liu, Zhi ^b   Machuca, Francisco ^c   Pianetta, Piero ^a   Spicer, William E ^a  

^a SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^b STANFORD UNIVERSITY   (United States)

^c Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL CLEANING; ELECTRON ENERGY LEVELS; HYDROGEN PEROXIDE; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; PHOTONS; SULFURIC ACID; SURFACES; SYNCHROTRON RADIATION; VACUUM APPLICATIONS; WATER;

PHOTOEMISSION ELECTRON SPECTROSCOPY; SYNCHROTRON RADIATION PHOTOEMISSION; VACUUM ANNEALING; VALENCE BAND;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0037263522     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1532738     Document Type: Article

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