Simple method for cleaning gallium nitride (0001)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1784-1786

  Machuca, Francisco ^a   Liu, Zhi ^b   Sun, Yun ^b   Pianetta, P ^a,c   Spicer, W E ^a,d   Pease, R F W ^a  

^a Stanford University   (United States)

^b STANFORD UNIVERSITY   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^d Intevac Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NEGATIVE ELECTRON AFFINITY (NEA);

ANNEALING; CHEMICAL CLEANING; CHEMISORPTION; ELECTRONIC STRUCTURE; HYDROGEN PEROXIDE; MONOLAYERS; SULFURIC ACID; SURFACE CLEANING; SURFACE REACTIONS; SYNCHROTRON RADIATION;

GALLIUM NITRIDE;

EID: 0036748875     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1503782     Document Type: Article

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