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Volumn 13, Issue 1, 2003, Pages 61-66

Humidity-controlled mesostructuration in CTAB-templated silica thin film processing. The existence of a modulable steady state

(7) Cagnol, Florence a Grosso, David a Soler Illia, Galo J De A A a Crepaldi, Eduardo L a Babonneau, Florence a Amenitsch, Heinz b Sanchez, Clément a

a SORBONNE UNIVERSITÉ (France)

b ERICH SCHMID INSTITUTE OF MATERIALS SCIENCE (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON DIOXIDE;

ARTICLE; EVAPORATION; FILM; HUMIDITY; INTERFEROMETRY; PROCESSING; RADIATION SCATTERING; STEADY STATE; VISCOSITY; WATER CONTENT;

EID: 0037251517 PISSN: 09599428 EISSN: None Source Type: Journal
DOI: 10.1039/b209640b Document Type: Article

Times cited : (198)

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