Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 63, Issue 2 II, 2001, Pages 1-9

  Yan, M ^a,c   Bogaerts, A ^a   Gijbels, R ^a   Goedheer, W J ^b  

^a UNIVERSITY OF ANTWERP   (Belgium)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^c TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 18344383230     PISSN: 15393755     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.63.026405     Document Type: Article

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