Fast modeling of the low-pressure capacitively coupled radio-frequency discharge based on the nonlocal approach

Applied Physics Letters

Volumn 69, Issue 16, 1996, Pages 2341-2343

  Berezhnoi, S V ^a   Kaganovich, I D ^a   Tsendin, L D ^a   Schweigert, V A ^b  

^a PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

^b KHRISTIANOVICH INSTITUTE OF THEORETICAL AND APPLIED MECHANICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012124220     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117518     Document Type: Article

References (8)

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5. U. Kortshagen and L. D. Tsendin, Appl. Phys. Lett. 65, 1355 (1994).
6. I. D. Kaganovich and L. D. Tsendin, IEEE Trans. Plasma Sci. PS-20, 86 (1992).
7. L. D. Tsendin, Plasma Sources Sci. Technol. 4, 200 (1995).
8. M. A. Liebermand and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).