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Volumn 30, Issue 4, 1997, Pages 255-263
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MOCVD technology for semiconductors
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Author keywords
MOCVD; Semiconductors
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Indexed keywords
ACCIDENT PREVENTION;
CHEMICAL REACTORS;
COSTS;
EPITAXIAL GROWTH;
HYDRIDES;
MANUFACTURE;
ORGANOMETALLICS;
SEMICONDUCTOR MATERIALS;
CARRIER GASES;
DOPANT;
GROWTH MECHANISM;
HETEROEPITAXY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
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EID: 0031101822
PISSN: 0167577X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-577X(96)00215-7 Document Type: Article |
Times cited : (69)
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References (22)
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